Biometric Quality Workshop II
November 7-8, 2007
National Institute of Standards and Technology
Archived Presentations
November 14, 2007: NIST thanks the speakers and attendees for making the Second NIST Biometric Quality Workshop a success. The speakers' presentations are now available and together they constitute the online proceedings of the workshop.
Background
Given the importance of biometric sample quality assessment in improving performance of operational systems, quality algorithms are being increasingly deployed: US-VISIT, PIV, and EU VIS. Each mandate the measurement and reporting of quality scores of captured images. Accordingly quality is the subject of active research. In addition biometric quality standardization is underway (ISO/IEC 29794) with the aim of uniform interpretation and interoperability of quality scores. In order to discuss capabilities vis-a-vis operational requirements, and to identify research needs, testing requirements, and standardization gaps, NIST is holding a workshop on November 7-8, 2007 in the Holiday Inn in Gaithersburg, Maryland. The workshop will provide a forum for experts to share their research and discuss problems and new developments. This workshop is a sequel to the workshop on quality NIST hosted in March 2006. Since then, NIST has been developed methods for quality summarization in support of quality monitoring, measuring quality of slap fingerprints, and has studied the role of human factors in quality. In addition, NIST is active in the SC37 and M1 standardization activities on biometric quality and sample conformance.
Workshop Program
The near-final program is posted here.
Please send your comments and suggestions to the organizers.Workshop Scope
The workshop is aimed at improving accuracy of biometric systems by incorporating quality assessment technologies into the sample acquisition process. It aims to assess current quality measurement capabilities and to identify technologies, factors, operational paradigms, and standards that can measurably improve quality. We propose a different format to that of the 2006 Quality Workshop: shorter presentations followed by discussions. We suggest (and expect) focusing on the following issues:
- quality by design
- quality calibration
- quality annotated datasets
- quality evaluation
More detail on the scop of the workshop can be found here. The workshop will be held over two days: Day One will consider operational needs and acquisition issues for finger, face and iris capture. Day two will consider quality calibration, quality evaluation and research and development for all modalities.
Call for Participation
NIST solicits presentations, case studies, papers, and participation from any interested parties including vendors, systems architects, integerators, researchers, and users. Please contact the organizers with any proposed subject matter. We will then update the preliminary program in response to the submissions received. We intend that material finally presented will be posted to the workshop web site. NIST encourages presentations and reports on preliminary work that participants plan to publish elsewhere.
Who Should Attend
The workshop is aimed at individuals concerned with development, deployment and use of biometric quality infrastructure. Particularly the Day One program will be suited to representatives of Federal, State and local government agencies, policy makers from US and International organizations, technology providers, systems integrators and developers. The Day Two program will be directed at developers, integrators, engineers, researchers and students. We consider the Day One content (i.e. needs and applications) to be of interest to those working in Day Two areas.