Measurement Process Characterization
2.6. Case studies
2.6.2. Check standard for resistivity measurements
|Explanation of check standard measurements||The process involves the measurement of resistivity (ohm.cm) of individual silicon wafers cut from a single crystal (# 51939). The wafers were doped with phosphorous to give a nominal resistivity of 100 ohm.cm. A single wafer (#137), chosen at random from a batch of 130 wafers, was designated as the check standard for this process.|
|Design of data collection and Database||
The measurements were carried out according to an ASTM Test Method
(F84) with NIST probe #2362.
The measurements on the check standard duplicate certification
measurements that were being made, during the same time period, on
individual wafers from crystal #51939. For the check standard there
The K = 25 days cover the time during which the individual wafers were being certified at the National Institute of Standards and Technology.
|Software||The analyses used in this case study can be generated using both Dataplot code and R code. The reader can download the data as a text file.|